Liquid cleaning equipment

Currently the only cleaning system capable of handling most cleaning solutions. Cleaning results exceed all other standards, with typical cleaning results of 1.56 ugNaCl/cm² for ionic contamination and 0.49 ugNaCl/cm² measured after cleaning. Wastewater treatment system restores rinse water to its original purity level Utilises centrifugal energy and heated moving air to completely dry complex products in seconds. Can be installed in cleanroom environments for medical and semiconductor manufacturing.

Detail

World-class, industry-recognised best-in-class liquid cleaning equipment

The only cleaning system currently available that can handle most cleaning solutions.

Cleaning results exceed all other standards, with typical cleaning results of 1.56 ugNaCl/cm² for ionic contamination and 0.49 ugNaCl/cm² measured after cleaning.

Wastewater treatment system restores rinse water to its original purity level

Utilises centrifugal energy and heated moving air to completely dry complex products in seconds.

Can be installed in cleanroom environments for medical and semiconductor manufacturing.

Liquid cleaning equipment